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Volume 4(1); Feb 2001
Article
차세대 ULSI interconnection을 위한 CVD 저유전율 박막 개발
Yun-Hae Kim, Hyeong-Jun Kim
Ceramist. 2001;4(1):5-13.   Published online February 28, 2001
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Reviews
구리반도체용 저유전재료의 신뢰성 평가
Guk-Heon Cha, Sang-Hyeon Ju, Yeong-Chang Ju
Ceramist. 2001;4(1):14-25.   Published online February 28, 2001
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반도체 다층배선의 층간 절연막으로서의 플라즈마 중합 유기박막
Dong-Geun Jeong
Ceramist. 2001;4(1):26-35.   Published online February 28, 2001
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저유전재료 연구개발동향
Chun-Geun Yu
Ceramist. 2001;4(1):36-41.   Published online February 28, 2001
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Article
0.1㎛ 이하 소자개발에서의 고유전 산화 박막의 개발
Man-Ho Jo
Ceramist. 2001;4(1):42-45.   Published online February 28, 2001
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Reviews
차세대 MOSFET 소자용 고유전율 게이트 절연막 기술
Hyeon-Sang Hwang
Ceramist. 2001;4(1):46-55.   Published online February 28, 2001
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원자층 증착 기술의 반도체 응용
Won-Yong Go
Ceramist. 2001;4(1):56-60.   Published online February 28, 2001
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고유전율 에피텍셜 유전체박막
Seong-Jin Jeon, Jae-Chan Lee
Ceramist. 2001;4(1):61-66.   Published online February 28, 2001
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반도체 배선을 위한 구리 증착 기술의 개발 현황
Seung-Gon Park, Do-Hyeong Kim
Ceramist. 2001;4(1):67-74.   Published online February 28, 2001
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Article
C-49 TiSi2를 확산원으로 사용하여 제작한 n+/p 접합의 누설 전류 억제에 관한 연구
Dong-Gyun Son
Ceramist. 2001;4(1):75-81.   Published online February 28, 2001
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Review
연료극 지지체형 고체산화물 연료전지의 성능 특성 -KEPRI's SOFC 개발 현황-
Yeong-Seong Yu, Jun-Ho Go
Ceramist. 2001;4(1):82-95.   Published online February 28, 2001
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