Review of alternative gate stack technology research during the last decade

Lee, Byoung-Hun; Kirsch, Paul; Alshareef, Husam; Majhi, Prashant; Choi, Rino; Song, Seung-Chul; Tseng, Hsing Huang; Jammy, Raj

Review

Ceramist 2006;9(4):58-71.
Published online August 31, 2006.

Review of alternative gate stack technology research during the last decade

Byoung-Hun Lee, Paul Kirsch, Husam Alshareef, Prashant Majhi, Rino Choi, Seung-Chul Song, Hsing Huang Tseng, Raj Jammy

IBM

Abstract

Scaling of the gate stack has been one of the major contributors to the performance enhancement of CMOSFET devices in past technology generations. The scalability of gate stack has diminished in recent years and alternative gate stack technology such as metal electrode and high-k dielectrics has been intensively studied during the last decade. Tody the performance of high-k dielectrics almost matches that of conventional $SiO_2-based$ gate dielectrics. However, many technical challenges remain to be resolved before alternative gate stacks can be introduced into mainstream technology. This paper reviews the research in alternative gate stack technologies to provide insights for future research.